Topic:
Glossary: O
Here you are going to find explications of important terms in plasma technology:
- OAUGDP
- Abbreviation for „One Atmosphere Uniform Glow Discharge Plasma“, thus a homogeneous glow discharge plasma at normal pressure.
- optical coatings
- Coating for the improvement of optical properties of glass, like e.g. index of refraction, IR absorption and reflection. The most common layer materials are the oxides of vanadium, aluminium, titan, tantalum, silicon, and siliconoxynitride. These can be applied as either single- or multilayer, or multiphase coatings, normally via plasma-supported PVD or CVD methods.
- o-ring coating
- see „coating of plastics“ / “pre-treatment of plastics“
- overetching
- Too long or too intense plasma etching and treatment, resulting in partial decomposition or suboptimal adhesion of the substrate material.
- overtreatment
- Too high plasma doses (thermal plasma effect) can yield melting of the surface. A new surface with the original surface properties is generated. In other cases, the surface can be decomposed thermally as well.
- oxidation
- Part of a reaction during which electrons are yielded, thus the oxidation number is increased. The oxidation number is a fictive ion charge of an atom which yields when all duplets a covalent bond are assigned to the electronegative bonding partner. The most popular oxidation reactions are performed with involvement of oxygen. Some examples are: hydrogen + oxygen = water; silicon + oxygen = silicon oxide; aluminium + oxygen = aluminium oxide; iron oxide, copper oxide, etc.
- oxygen
- In the plasma state, oxygen has an outstanding reactivity. Oxygen is the most important process gas in plasma processors.
