Topic: Plasma treatment of silicon wafers. Nano-plasma cleaning, super-fine cleaning of wafers.

Nano-Plasma Cleaning of Silicon Wafers

Wafer manufacturing begins with a block of semiconductor material. This is sliced (sawed) into wafers, which are then polished in a chemical/mechanical process until the required surface roughness of a few nanometers is achieved.
Nanoreinigung eines WaferPolished and plasma treated wafer
In the next step, Openair® plasma is used as a highly efficient and simple procedure for super-fine cleaning of these nano-structures. One hundred percent of carbohydrates and particles are removed and error rates can be significantly reduced using this Openair® Plasma cleaning.

back to main topic Wafers/Chips

Plasmatreat (UK) Ltd.
36 Grange Park
Steeple Aston
Bicester
OXON OX25 4SR
Great Britain

Phone: +44 1869 340478

Contact: Mr. Graham Porcas
grahamporcas@btconnect.com

 
Plasma beam cleans and activates covering and sealing surfaces
"Give Leaks No Chance" - Plasma-pre-treatment protects electronics
Secure protection for electronic components
parts2clean
Leading International Trade Fair for Industrial Parts and Surface Cleaning

31. May – 2. June 2016
Hall 5, Booth E19
Messegelände Stuttgart, Germany

DRUPA

31. May – 10. June 2016
Hall 11, Booth D29
Düsseldorf Fairgrounds , Germany

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