Topic: Plasma treatment of silicon wafers. Nano-plasma cleaning, super-fine cleaning of wafers.

Nano-Plasma Cleaning of Silicon Wafers

Wafer manufacturing begins with a block of semiconductor material. This is sliced (sawed) into wafers, which are then polished in a chemical/mechanical process until the required surface roughness of a few nanometers is achieved.
Nanoreinigung eines WaferPolished and plasma treated wafer
In the next step, Openair® plasma is used as a highly efficient and simple procedure for super-fine cleaning of these nano-structures. One hundred percent of carbohydrates and particles are removed and error rates can be significantly reduced using this Openair® Plasma cleaning.

back to main topic Wafers/Chips

Plasmatreat UK Ltd.
D5 Culham Science Centre,
Abingdon, Oxfordshire
OX14 3DB
Great Britain

Phone: +44 1865 408324

Contact: Mr. Graham Porcas

Plasma beam cleans and activates covering and sealing surfaces
"Give Leaks No Chance" - Plasma-pre-treatment protects electronics
Secure protection for electronic components
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